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MDA-12FA article
MDA-12FA
Easy operation UI
PC Operation with PLC control
Image grab & Data log
More than 100 Program recipes
Microscope position control system
Auto Align mark searching function
 
Photo-litho / Exposure System / Auto - MDA-12FA

 

  • specification
     
    • Type Full automatic
    Mask size up to 14" x 14"
    Substrate size 12" circle
    UV lamp & Power 5kW lamp & power supply
    Uniform beam size 13.25" x 13.25"
    Beam Uniformity <±5%
    Beam wavelength 350 ~ 450nm
    365nm Intensity 25~60mW/cm2 (5kW)
    Alignment accuracy 1um
    Process resolution 1um@1um PR thickness with vacuum contact
    Process mode Soft, Hard, Vacuum contact & Proximity
    Substrate chuck moving x,y,z & θ (Motorized)
    Pre-aligner ±50um
    Frame Anti-Vibration system
    Options UV Intensity meter
    tc.

 

 



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Mask Aligner and Spin Coater equipment