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MDA-150 article
MDA-150 (M)
Easy operation UI
PC Operation with PLC control
Image grab & Data log
More than 100 Program recipes
 
Photo-litho / Exposure System / Manual - MDA-150 (M)

 

  • specification
     
    • Type Manual
    Mask size up to 7" x 7"
    Substrate size piece to 6"
    UV lamp & Power 500W, 1kW & Digital power supply
    Uniform beam size 6.25" x 6.25
    Beam Uniformity <±5%
    Beam wavelength 350 ~ 450nm
    365nm Intensity ~50mW/cm2
    Alignment accuracy 1um
    Process resolution 1um@1um PR thickness with vacuum contact
    Process mode Soft, Hard, Vacuum contact & Proximity
    Substrate chuck moving x,y,z & θ (motorized)
    Options CCD BSA

 

 



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Mask Aligner and Spin Coater equipment