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MDA-400LJ article
MDA-400LJ
Easy operation & Installation
Handling Substrates of Various sizes
Adopt UV-LED exposure module
UV-LED Life-time is long
 
Photo-litho / Exposure System / Manual - MDA-400LJ

 

  • specification
     
    • Type Fully manual
    Mask size up to 5" x 5"
    Substrate size piece to 4" dia
    UV lamp & Power UV-LED & power supply
    Uniform beam size 125mm dia
    Beam Uniformity <±3%
    Beam wavelength 365nm Only
    365nm Intensity ~20mW/cm2
    Alignment accuracy 1um
    Process resolution 1um@1um PR thickness with vacuum contact
    Process mode Soft, Hard, Vacuum contact & Proximity
    Substrate chuck moving x,y,z & θ
    Options etc.

 

 



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Mask Aligner and Spin Coater equipment