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MDA-400M article
MDA-400M
Easy operation & Installation
Handling Substrates of Various sizes
PLC control with Touch screen panel
 
Photo-litho / Exposure System / Manual - MDA-400M

 

  • specification
     
    • Type Manual (PLC control)
    Mask size up to 7" x 7"
    Substrate size piece to 6"
    UV lamp & Power 350W & power supply
    Uniform beam size 6.25" x 6.25"
    Beam Uniformity <±5%
    Beam wavelength 350 ~ 450nm
    365nm Intensity ~25mW/cm2
    Alignment accuracy 1um
    Process resolution 1um@1um PR thickness with vacuum contact
    Process mode Soft, Hard, Vacuum contact & Proximity
    Substrate chuck moving x,y,z & θ
    Options
    Anti-Vibration table
    IR BSA
    UV Intensity meter
    UV-LED(365nm) exposure module
    etc.

 

 



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Mask Aligner and Spin Coater equipment